A. X. Li1,2,3,?, C. Y. Qin1,3,?, H. Zhang1,4,*, S. Li1, L. L. Fan1,3, Q. S. Wang1,5, T. J. Xu1, N. W. Wang1, L. H. Yu1, Y. Xu1, Y. Q. Liu1, C. Wang1, X. L. Wang1, Z. X. Zhang1, X. Y. Liu1, P. L. Bai1, Z. B. Gan1, X. B. Zhang1, X. B. Wang1, C. Fan1, Y. J. Sun1, Y. H. Tang1, B. Yao1, X. Y. Liang1,4, Y. X. Leng1,4, B. F. Shen1,6,*, L. L. Ji1,4,*, R. X. Li1,2,4,* and Z. Z. Xu1
中國(guó)科學(xué)院上海光學(xué)精密機(jī)械研究所李儒新院士、吉亮亮研究員、沈百飛研究員、張輝副研究員
1 State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai201800, China
2 ShanghaiTech University, Shanghai201210, China
3 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, China
4 CAS Center for Excellence in Ultra-intense Laser Science, Shanghai201800, China
5 College of Science, University of Shanghai for Science and Technology, Shanghai200093, China
6 Department of Physics, Shanghai Normal University, Shanghai200234, China
? These authors contributed equally to this work.
